9_glossary.md
SemiDevKit — Glossary of Technical Terms
This glossary defines key semiconductor, SPICE, TCAD, and physical‑design terms used across SemiDevKit.
A
AC Analysis
Small‑signal frequency‑domain analysis used to obtain gain, impedance, or frequency response.
Anneal
Thermal treatment used to activate dopants or modify material properties.
B
BSIM4
A physics‑based MOSFET compact model widely used in SPICE simulators for deep‑submicron CMOS nodes (130 nm → 20 nm).
Butterfly Curve (S–E Curve)
Strain–Electric field curve for ferroelectric or piezoelectric materials.
C
Cgg
Total gate capacitance:
Cgg = ∂Qg/∂Vg, physically meaningful compared to partitioned Cgs/Cgd/Cgb.
CV Curve
Capacitance–Voltage relation for MOSCAPs or MOSFET gate behavior.
Compact Model
Simplified mathematical representation of device I–V/C–V used in circuit simulators.
D
DIBL (Drain-Induced Barrier Lowering)
Reduction of threshold voltage with increasing drain voltage in short‑channel MOSFETs.
DIM (Dimension Sweep)
L/W sweep used to study short‑channel and narrow‑width effects.
E
EOT (Equivalent Oxide Thickness)
Effective thickness of gate dielectric, accounting for high‑k materials.
Extracted Parameters
Measured or simulated device characteristics such as Vth, gmmax, Idlin, Idsat.
F
Ferroelectric
Material exhibiting spontaneous polarization reversible by electric field (used in PZT analysis).
G
gm (Transconductance)
Derivative of Id w.r.t Vg. gmmax is often used for Vth extraction.
H
HCI (Hot-Carrier Injection)
Reliability degradation mechanism in NMOS due to high‑energy carriers damaging the gate oxide.
I
Idsat
Saturation drain current at high Vd.
Idlin
Linear‑region drain current at low Vd.
L
Lateral Electric Field
Field along the channel direction; strongly influences hot‑carrier effects.
Layout
Geometric representation of circuit shapes for fabrication.
M
Mobility (μ)
Carrier mobility; decreases with vertical field, scattering, and temperature.
MOSCAP
Metal‑Oxide‑Semiconductor capacitor used for CV characterization.
N
NBTI (Negative Bias Temperature Instability)
PMOS reliability degradation mechanism producing negative Vth shift.
O
OpenLane
Open‑source RTL‑to‑GDS flow; OpenLane‑Lite is a reduced version included in SemiDevKit.
P
Paramus
Physical‑to‑BSIM4 model card generator included in SemiDevKit.
Poisson Equation
Governs electrostatic potential inside semiconductor materials; solved in TCAD modules.
PZT
Lead Zirconate Titanate, a ferroelectric/piezoelectric material.
R
Results Directory
Folder storing *.csv, *.dat, *.png, and extracted parameters for reproducibility.
S
SCE (Short-Channel Effects)
Phenomena degrading device behavior as channel length shrinks.
SPICE
Simulation Program with Integrated Circuit Emphasis—industry standard analog simulator.
T
TCAD (Technology CAD)
Device‑level simulation techniques (Poisson, drift‑diffusion, quantum corrections).
Template
SPICE netlist skeleton used by analyzers to generate simulation cases.
V
Vth (Threshold Voltage)
Gate voltage where inversion forms; extracted via gmmax or constant‑current method.
Vtg / Vtc
Threshold values extracted via:
- gmmax peak method (Vtg)
- constant‑current method (Vtc)
W
Width (W)
MOSFET conduction width; strongly impacts current and SCE.
Z
Zr/Ti Ratio
Composition variable in PZT models affecting polarization behavior.